Guest Talk: Steven J. Koester "Toward a Manufacturable Contact Process for 2D TMD MOSFETs using Atomic Layer Deposition"

At this Friday's Get-together, the TRR404 Active-3D team enjoyed an online talk by Steven Koester of the University of Notre Dame titled "Toward a Manufacturable Contact Process for 2D TMD MOSFETs using Atomic Layer Deposition".
Steven talked about Transition Metal Dichalcogenides (TMDs) as an important class of materials for future microelectronics. Of particular interest are TMDs deposited by atomic layer deposition (ALD) since this technique allows both back-end-of-line (BEOL) compatible deposition and the ability to create heavily-doped regions for contact formation. Steve described the progress on the growth and integration of heavily-doped TMDs to create contacts for 2D-channel MOSFETs. After providing an outlook for future research needed to address the outstanding challenges for ALD-based TMD contacts, he reviewed the potential applications of ALD-deposited TMDs in monolithic 3DICs.

We thank Steven Koester very much for giving the talk today, just before heading to the IEDM Conference in San Francisco.